Quantitative Evaluation of the Chemical State of Copper Oxide in XPS Depth Profiling Data by Simultaneous Analysis with Photoelectron and Auger Electron Peaks

• 資料種別: 記事
• タイトル: Quantitative Evaluation of the Chemical State of Copper Oxide in XPS Depth Profiling Data by Simultaneous Analysis with Photoelectron and Auger Electron Peaks
• 著者・編者: Hiroshi Okumura; Hiroshi Shinotsuka; Ryo Murakami; Kenji Nagata; Sho Okamoto; Masamitsu Sato
• 著者標目: Hiroshi Okumura; Hiroshi Shinotsuka; Ryo Murakami; Kenji Nagata; Sho Okamoto; Masamitsu Sato
• タイトル（掲載誌）: Journal of surface analysis / 表面分析研究会 編
• 巻号年月日等（掲載誌）: 31(3):2025.3
• 掲載巻: 31
• 掲載号: 3
• 掲載ページ: 234-248
• 掲載年月日（W3CDTF）: 2025-03
• ISSN（掲載誌）: 1341-1756
• ISSN-L（掲載誌）: 1341-1756
• 出版事項（掲載誌）: 東京 : 表面分析研究会
• 出版地（国名コード）: JP
• 本文の言語コード: eng
• NDLC: ZM35
• 対象利用者: 一般
• 所蔵機関: 国立国会図書館
• 請求記号: Z15-B66
• 連携機関・データベース: 国立国会図書館 : 国立国会図書館雑誌記事索引; https://ndlsearch.ndl.go.jp
• 書誌ID（NDLBibID）: 034060480; http://id.ndl.go.jp/bib/034060480
• 整理区分コード: 632

• 要約等: Quantitative surface analysis of the chemical state of copper materials is important for understanding the bonding process between copper and different materials. X-ray photoelectron spectroscopy (XPS) is expected to be able to distinguish between 0- to 2-valent copper compounds based on the positions of photoelectron and Auger electron peaks. However, quantitative component analysis of multiphase copper compounds using XPS has been difficult because the difference in chemical shifts between copper with different valences is small and the fine structure of the XPS spectrum varies depending on the copper compound type even for the same valence. In this study, we applied a recently developed technique to simultaneously analyze both Auger and photoelectron peaks automatically and comprehensively in the case of the depth profiling of naturally oxidized copper, and to establish a quantitative evaluation method for the chemical state of copper compounds.
• DOI: 10.1384/jsa.31.234
• オンライン閲覧公開範囲: インターネット公開
• 連携機関・データベース: 科学技術振興機構 : J-STAGE; http://www.jstage.jst.go.jp

• 要約等: Quantitative surface analysis of the chemical state of copper materials is important for understanding the bonding process between copper and different materials. X-ray photoelectron spectroscopy (XPS) is expected to be able to distinguish between 0- to 2-valent copper compounds based on the positions of photoelectron and Auger electron peaks. However, quantitative component analysis of multiphase copper compounds using XPS has been difficult because the difference in chemical shifts between copper with different valences is small and the fine structure of the XPS spectrum varies depending on the copper compound type even for the same valence. In this study, we applied a recently developed technique to simultaneously analyze both Auger and photoelectron peaks automatically and comprehensively in the case of the depth profiling of naturally oxidized copper, and to establish a quantitative evaluation method for the chemical state of copper compounds.
• DOI: 10.1384/jsa.31.234; https://doi.org/10.1384/jsa.31.234
• 関連情報（URI）: http://id.ndl.go.jp/bib/034060480; https://ndlsearch.ndl.go.jp/books/R000000004-I034060480; https://www.jstage.jst.go.jp/article/jsa/31/3/31_248/_pdf
• 参照: Development of multiple core-level XPS spectra decomposition method based on the Bayesian information criterion; https://cir.nii.ac.jp/crid/1050579156082006656; Bayesian estimation analysis of X-ray photoelectron spectra: Application to Si 2p spectrum analysis of oxidized silicon surfaces; https://cir.nii.ac.jp/crid/1360025030625819648; Advanced analysis of copper X‐ray photoelectron spectra; https://cir.nii.ac.jp/crid/1360855568898009472; Comprehensive X-ray Photoelectron Spectroscopy Study of the Conversion Reaction Mechanism of CuO in Lithiated Thin Film Electrodes; https://cir.nii.ac.jp/crid/1363951794010215808
• 連携機関・データベース: 国立情報学研究所 : CiNii Research; https://cir.nii.ac.jp/
• 提供元機関・データベース: Japan Link Center; https://japanlinkcenter.org/top; 雑誌記事索引データベース; https://ndlsearch.ndl.go.jp; Crossref; https://www.crossref.org
• 書誌ID（NDLBibID）: 034060480; http://id.ndl.go.jp/bib/034060480