Hydrogen plasma pretreatment effect on the deposition of aluminum thin films from metalorganic chemical vapor deposition using dimethylethylamine alane

• 資料種別: 記事
• タイトル: Hydrogen plasma pretreatment effect on the deposition of aluminum thin films from metalorganic chemical vapor deposition using dimethylethylamine alane
• 著者標目: Tae Woong Jang; Hwa Sung Rhee; Byung Tae Ahn
• 出版年月日等: 1999-05-01
• 出版年（W3CDTF）: 1999-05-01
• タイトル（掲載誌）: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
• 巻号年月日等（掲載誌）: 17 3
• 掲載巻: 17
• 掲載号: 3
• 掲載ページ: 1031-1035
• 掲載年月日（W3CDTF）: 1999-05-01
• ISSN（掲載誌）: 07342101
• 出版事項（掲載誌）: American Vacuum Society
• 件名標目: Surfaces, Coatings and Films; Surfaces and Interfaces; Condensed Matter Physics
• 対象利用者: 一般
• DOI: 10.1116/1.581678
• 作成日（W3CDTF）: 2002-07-27
• 関連情報（URI）: https://pubs.aip.org/avs/jva/article-pdf/17/3/1031/8186394/1031_1_online.pdf
• 参照: Effect of the H₂ plasma treatment of a seed layer on the synthesis of ZnO nanorods using a microwave hydrothermal method; https://cir.nii.ac.jp/crid/1360284924865799936; Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN.; https://cir.nii.ac.jp/crid/1390001206253719552
• 連携機関・データベース: 国立情報学研究所 : CiNii Research; https://cir.nii.ac.jp/
• 提供元機関・データベース: Crossref; https://www.crossref.org

• 要約等: <jats:p>To study the effect of pretreatment of substrates on the deposition behavior of Al thin films, the surfaces of TiN and SiO2 substrates were ex...