Corrosion control technique in copper metallization using gas dissolved water

• 資料種別: 記事
• タイトル: Corrosion control technique in copper metallization using gas dissolved water
• 著者標目: M. Kamezawa; Yoshitaka Matsui; Naoto Miyashita; Masako Kodera; H. Kosukegawa; K. Ito
• 出版年月日等: 2003-06-25
• 出版年（W3CDTF）: 2003-06-25
• タイトル（掲載誌）: Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519)
• 掲載ページ: 105-107
• 掲載年月日（W3CDTF）: 2003-06-25
• 出版事項（掲載誌）: IEEE
• 対象利用者: 一般
• DOI: 10.1109/iitc.2002.1014903; https://doi.org/10.1109/iitc.2002.1014903
• 連携機関・データベース: 国立情報学研究所 : CiNii Research; https://cir.nii.ac.jp/

• 要約等: Copper wiring corrosion occurs after CMP as well as during CMP. It can be reduced by post-CMP cleaning using gas dissolved water. A leakage current be...