雑誌日立国際電気技報
Volume number(15):2014年度版
Article3次元半導体デバイス...

3次元半導体デバイス向け高品質絶縁膜積層技術の開発

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3次元半導体デバイス向け高品質絶縁膜積層技術の開発

Call No. (NDL)
Z74-C327
Bibliographic ID of National Diet Library
026228524
Material type
記事
Author
赤江 尚徳ほか
Publisher
羽村 : 日立国際電気
Publication date
2014
Material Format
Paper
Journal name
日立国際電気技報 / 企画部研究管理課 編 (15):2014年度版
Publication Page
p.9-12
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Paper

Material Type
記事
Title
3次元半導体デバイス向け高品質絶縁膜積層技術の開発
Author/Editor
赤江 尚徳
寺崎 昌人
尾崎 貴志 他
Author Heading
赤江 尚徳
寺崎 昌人
尾崎 貴志
Alternative Title
Development of high quality dielectric film stacking technology for 3-dimensional semiconductor devices
Periodical title
日立国際電気技報 / 企画部研究管理課 編
No. or year of volume/issue
(15):2014年度版
Issue
15
Pages
9-12
Publication date of volume/issue (W3CDTF)
2014