Novel precursors for SiCH low-k caps beyond the 22nm node: reactions of silacyclopentane precursors in the plasma-enhanced chemical vapor deposition process and structural analyses of SiCH films (Special issue: Dry process)

Novel precursors for SiCH low-k caps beyond the 22nm node: reactions of silacyclopentane precursors in the plasma-enhanced chemical vapor deposition process and structural analyses of SiCH films

(Special issue: Dry process)

Call No. (NDL): Z53-A375
Bibliographic ID of National Diet Library: 11211055

Material type: 記事

Author: Hideharu Shimizuほか

Publisher: Tokyo : The Japan Society of Applied Physics

Publication date: 2011-08

Material Format: Paper

Journal name: Japanese journal of applied physics : JJAP 50(8) (3) 2011.8

Publication Page: p.08KA01-1～9

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Paper

Material Type: 記事
Title: Novel precursors for SiCH low-k caps beyond the 22nm node: reactions of silacyclopentane precursors in the plasma-enhanced chemical vapor deposition process and structural analyses of SiCH films
Author/Editor: Hideharu Shimizu
Nobuo Tajima
Takeshi Kada 他
Series Title: Special issue: Dry process
Author Heading: Hideharu Shimizu
Nobuo Tajima
Takeshi Kada
Periodical title: Japanese journal of applied physics : JJAP
No. or year of volume/issue: 50(8) (3) 2011.8
Volume: 50
Issue: 8
Other Volume: 3
Pages: 08KA01-1～9
Publication date of volume/issue (W3CDTF): 2011-08
ISSN (Periodical Title): 0021-4922
ISSN-L (Periodical Title): 0021-4922
Publication (Periodical Title): Tokyo : The Japan Society of Applied Physics
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: ZM35
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-A375
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 11211055
http://id.ndl.go.jp/bib/11211055
Bibliographic Record Category (NDL): 632