ZrB2薄膜のキャラクタリゼーションとCu/SiO2間のバリヤ特性 (電子部品・材料)

ZrB2薄膜のキャラクタリゼーションとCu/SiO2間のバリヤ特性

(電子部品・材料)

Journal name: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 107(325) 2007.11.16・17

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Material Type: 記事
Title: ZrB2薄膜のキャラクタリゼーションとCu/SiO2間のバリヤ特性
Author/Editor: 武山真弓
中台保夫
神原正三他
Series Title: 電子部品・材料
Author Heading: 武山真弓
中台保夫
神原正三
Alternative Title: Characterization and barrier properties of ZrB2 thin films for Cu interconnects
Periodical title: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue: 107(325) 2007.11.16・17
Volume: 107
Issue: 325
Pages: 35～38
Publication date of volume/issue (W3CDTF): 2007-11
ISSN (Periodical Title): 0913-5685
ISSN-L (Periodical Title): 0913-5685
Publication (Periodical Title): 東京 : 電子情報通信学会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: Cu配線
拡散バリヤ
ZrB2
熱的安定性
Cu interconnects
diffusion barrier
thermal stability
NDLC: ZN33
Target Audience: 一般
Report No. (Article): CPM2007-111
Holding library: 国立国会図書館
Call No.: Z16-940
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 9292670
http://id.ndl.go.jp/bib/9292670
Bibliographic Record Category (NDL): 632