New Development of Ultrahigh-Vacuum Oriented-Molecular-Beam Machine and Its Application to Chemical Reactions on Silicon Surface 44 12

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New Development of Ultrahigh-Vacuum Oriented-Molecular-Beam Machine and Its Application to Chemical Reactions on Silicon Surface

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Summary, etc.：: The stereochemical control of surface reactions is one of the ultimate goals of surface scientists. An oriented-molecular-beam technique based on the ...

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Material Type: 記事
Title: New Development of Ultrahigh-Vacuum Oriented-Molecular-Beam Machine and Its Application to Chemical Reactions on Silicon Surface
Volume: 44
12
Author/Editor: Okada Michio
Moritani Kousuke
Goto Seishiro
Kasai Toshio
Author Heading: Okada Michio
Moritani Kousuke
Goto Seishiro
Kasai Toshio
Publication Date: 2005
Publication Date (W3CDTF): 2005
Periodical title: Japanese Journal of Applied Physics
No. or year of volume/issue: 44 12
Volume: 44
Issue: 12
Pages: 8580-8589
ISSN (Periodical Title): 0021-4922
1347-4065
Subject Heading: silicon
methylchloride
dissociative adsorption
oriented molecular beam
steric effect
Target Audience: 一般
DOI: 10.1143/JJAP.44.8580
Access Restrictions: インターネット公開
Data Provider (Database): 科学技術振興機構 : J-STAGE