Studies on effect of excitation frequency on neutral radicals in very high frequency capacitively coupled plasma

Digital data available（名古屋大学学術機関リポジトリ）

学術機関リポジトリデータベース（IRDB）（機関リポジトリ）

Studies on effect of excitation frequency on neutral radicals in very high frequency capacitively coupled plasma

Notes on use

Detailed bibliographic record

Summary, etc.：: The effect of the excitation frequency on the neutral radical and the contribution to the film deposition in VHF-CCP was investigated in this thesis. ...

Search by Bookstore

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

NAGOYA Repository
Digital
You can check the holdings of institutions and databases with which Institutional Repositories DataBase(IRDB)(Institutional Repository) is linked at the site of Institutional Repositories DataBase(IRDB)(Institutional Repository).
NAGOYA Repository

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 博士論文
Title: Studies on effect of excitation frequency on neutral radicals in very high frequency capacitively coupled plasma
Author/Editor: Ohta, Takayuki
Author Heading: Ohta, Takayuki
Publication Date: 2004-03-25
Publication Date (W3CDTF): 2004
Alternative Title: VHF容量結合プラズマ中の中性ラジカルにおける励起周波数の効果に関する研究
Degree grantor/type: 名古屋大学
Nagoya University
Dissertation Number: 甲第6268号
Degree Type: 博士(工学)
Target Audience: 一般
Note (General): 名古屋大学博士学位論文学位の種類:博士(工学) (課程) 学位授与年月日:平成16年3月25日
Format (IMT): application/pdf
Source: ko6268.pdf （fulltext）
https://nagoya.repo.nii.ac.jp/record/9773/files/ko6268.pdf
Access Restrictions: インターネット公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 名古屋大学 : 名古屋大学学術機関リポジトリ