液滴エピタキシー法による量子ドットの作製技術

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Material Type: 図書
Title: 液滴エピタキシー法による量子ドットの作製技術
Author/Editor: 間野高明
大竹晃浩
Author Heading: 著：間野高明
https://orcid.org/0000-0002-6955-260X
著：大竹晃浩
https://orcid.org/0000-0002-3519-4613
Publication, Distribution, etc.: (株)エヌ・ティー・エス
Publication Date: 2025年9月
Periodical title: 量⼦ドット技術の最前線
Text Language Code: und
Subject Heading: 液滴エピタキシー
GaAs
InAs
量子ドット
量子光源
Target Audience: 一般
Note (General): 出版タイプ： AM
DOI: 10.48505/nims.5812
https://doi.org/10.48505/nims.5812
Access Restrictions: インターネット公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 物質・材料研究機構 : Materials Data Repository