Ultrathin SiO2 and high-K materials for ULSI gate dielectrics : Symposium : Apr 1999, San Francisco, CA. (Materials Research Society Symposia Proceedings ; 567)

Ultrathin SiO2 and high-K materials for ULSI gate dielectrics : Symposium : Apr 1999, San Francisco, CA.

(Materials Research Society Symposia Proceedings ; 567)

Call No. (NDL): M17-99-2158
Bibliographic ID of National Diet Library: 000003509740

Material type: 図書

Author: Materials Research Society.

Publisher: Materials Research Society

Publication date: 1999.

Material Format: Paper

Capacity, size, etc.: v.

NDC: -

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Notes on use

Note (General)：: Papers.Held as part of the 1999 Materials Research Society spring meeting.Index term: MRS ; ULSI gate dielectrics ; ultrathin SiO2 materials ; high K ...

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Paper

Material Type: 図書
ISBN: 1558994742
ISSN: 0272-9172
Title: Ultrathin SiO2 and high-K materials for ULSI gate dielectrics : Symposium : Apr 1999, San Francisco, CA.
Series Title: Materials Research Society Symposia Proceedings ; 567
Author Heading: Materials Research Society.
Publication, Distribution, etc.: Warrendale, PA : Materials Research Society
Publication Date: 1999.
Publication Date (W3CDTF): 1999
Extent: v.
Alternative Title: Held as part of the 1999 Materials Research Society spring meeting
MRS ; ULSI gate dielectrics ; ultrathin SiO2 materials ; high K materials
NDLC: M17
ND
Note (General): Papers.
Held as part of the 1999 Materials Research Society spring meeting.
Index term: MRS ; ULSI gate dielectrics ; ultrathin SiO2 materials ; high K materials.
BL shelfmark: 5396.412 vol 567 1999.
Holding library: 国立国会図書館
Call No.: M17-99-2158
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003509740
http://id.ndl.go.jp/bib/000003509740
UKMARC No.: G05895981
Bibliographic Record Category (NDL): 215