Photomask and next-generation lithography mask technology 9 : 23-25 April 2002 : Yokohama, Japan. : photomask Japan 2002 : Apr 2002, Yokohama, Japan. (SPIE Proceedings ; 4754)

Photomask and next-generation lithography mask technology 9 : 23-25 April 2002 : Yokohama, Japan. : photomask Japan 2002 : Apr 2002, Yokohama, Japan.

(SPIE Proceedings ; 4754)

Call No. (NDL): M17-03-4175
Bibliographic ID of National Diet Library: 000004232518

Material type: 図書

Author: Japan Society of Applied Physics.ほか

Publisher: SPIE

Publication date: c2002.

Material Format: Paper

Capacity, size, etc.: xxx, 918 p. : ill. ; 28 cm.

NDC: -

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Notes on use

Note (General)：: Papers."This conference ... was the ninth international symposium held in Japan ..." -- on introd.

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Paper

Material Type: 図書
ISBN: 0819445177
ISSN (series): 0277-786X
Title: Photomask and next-generation lithography mask technology 9 : 23-25 April 2002 : Yokohama, Japan. : photomask Japan 2002 : Apr 2002, Yokohama, Japan.
Series Title: SPIE Proceedings ; 4754
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering. v. 4754.
Author Heading: Japan Society of Applied Physics.
Kawahira, Hiroichi.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2002.
Publication Date (W3CDTF): 2002
Extent: xxx, 918 p. : ill. ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Masks (Electronics) -- Congresses.
Integrated circuits -- Masks -- Congresses.
X-ray lithography -- Congresses.
Microlithography -- Congresses.
Optoelectronic devices -- Design and construction -- Congresses.
NDLC: M17
Note (General): Papers.
"This conference ... was the ninth international symposium held in Japan ..." -- on introd.
Note (Bibliography): Includes bibliographic references and author index.
Holding library: 国立国会図書館
Call No.: M17-03-4175
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000004232518
http://id.ndl.go.jp/bib/000004232518
RLIN No.: MOHG50613555-B
Bibliographic Record Category (NDL): 215