Selective, deep Si trench etching with dimensional control SAND980490C DE98 006147 CONF980918

Selective, deep Si trench etching with dimensional control

SAND980490C DE98 006147 CONF980918

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 規格・テクニカルリポート類
Title: Selective, deep Si trench etching with dimensional control
Author/Editor: Shul, R. J
Willison, C. G
Zhang, L
Publication Date: 1998
Publication Date (W3CDTF): 1998
Extent: 10 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : SAND980490C
テクニカルリポート番号 : DE98 006147
テクニカルリポート番号 : CONF980918
Holding library: 国立国会図書館
Call No.: LS-DE98/006147
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005896189
http://id.ndl.go.jp/bib/000005896189
Bibliographic Record Category (NDL): 291