Oxides and oxide films. (The Anodic behavior of metals and semiconductors series)

Oxides and oxide films.

(The Anodic behavior of metals and semiconductors series)

Notes on use

Note (General)：: Editor: v. 1-4, J. W. Diggle (v. 3-4 with A. K. Vijh) ; v. 5- , A. K. Vijh.

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Material Type: 図書
ISSN: 0197-8950
Title: Oxides and oxide films.
Series Title: The Anodic behavior of metals and semiconductors series
Author Heading: Diggle, John W.
Vijh, Ashok K.
Publication, Distribution, etc.: New York : M. Dekker
Publication Date: [1972-
Publication Date (W3CDTF): 1972
Extent: v. ill. 24 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Metallic oxides.
Metallic films.
Metals -- Anodic oxidation.
NDLC: PA181
Note (General): Editor: v. 1-4, J. W. Diggle (v. 3-4 with A. K. Vijh) ; v. 5- , A. K. Vijh.
Holding library: 国立国会図書館
Call No.: PA181-38
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000006390020
http://id.ndl.go.jp/bib/000006390020
Bibliographic Record Category (NDL): 211