New accurate methods of aberration and polarization evaluation for lithography optics

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Material Type: 博士論文
Title: New accurate methods of aberration and polarization evaluation for lithography optics
Author/Editor: Hiroshi Nomura [著]
Author Heading: 野村, 博ノムラ, ヒロシ
Publication, Distribution, etc.: [Hiroshi Nomura]
Publication Date: [2007]
Publication Date (W3CDTF): 2007
Extent: 1冊
Alternative Title: リソグラフィ装置の収差と偏光に関する新規高精度評価法リソグラフィソウチノシュウサトヘンコウニカンスルシンキコウセイドヒョウカホウ
Degree grantor/type: 東北大学
Date Granted: 平成19年3月14日
Date Granted (W3CDTF): 2007
Dissertation Number: 乙第8838号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2007-M812
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000009090880
http://id.ndl.go.jp/bib/000009090880
Bibliographic Record Category (NDL): 213