Advanced etch technology for nanopatterning VI : 27 February-1 March 2017 : San Jose, California, United States : SPIE etch conference : international symposium on advanced lithography : Feb 2017, San Jose, CA. (SPIE Proceedings ; 10149)

Advanced etch technology for nanopatterning VI : 27 February-1 March 2017 : San Jose, California, United States : SPIE etch conference : international symposium on advanced lithography : Feb 2017, San Jose, CA.

(SPIE Proceedings ; 10149)

Call No. (NDL): M17-18-1308
Bibliographic ID of National Diet Library: 028410649

Material type: 図書

Author: -

Publisher: SPIE

Publication date: [2017]

Material Format: Paper

Capacity, size, etc.: 1 volume (various pagings) ; 28 cm.

NDC: -

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Notes on use

Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN: 9781510607491
ISSN (series): 0277-786X
Title: Advanced etch technology for nanopatterning VI : 27 February-1 March 2017 : San Jose, California, United States : SPIE etch conference : international symposium on advanced lithography : Feb 2017, San Jose, CA.
Series Title: SPIE Proceedings ; 10149
Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
Publication Date: [2017]
Publication Date (W3CDTF): 2017
Extent: 1 volume (various pagings)
Size: 28 cm.
Alternative Title: Advanced etch technology for nanopatterning 6 : 27 February-1 March 2017 : San Jose, California, United States
SPIE. advanced lithography
Place of Publication (Country Code): US
Text Language Code: eng
Content Type: text
Media Type: unmediated
Carrier Type: volume
NDLC: M17
Target Audience: 一般
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-18-1308
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 028410649
http://id.ndl.go.jp/bib/028410649
Cataloging Rule: RDA
Bibliographic Record Category (NDL): 215