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博士論文

Study on atomic layer etching of silicon dioxide via surface modified with plasma for advanced silicon-based device fabrication

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Study on atomic layer etching of silicon dioxide via surface modified with plasma for advanced silicon-based device fabrication

Persistent ID (NDL)
info:ndljp/pid/13587461
Material type
博士論文
Author
OSONIO, Airah Peraro
Publisher
-
Publication date
2024-02-29
Material Format
Digital
Capacity, size, etc.
-
Name of awarding university/degree
名古屋大学,博士(工学)
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Digital

Material Type
博士論文
Title
Study on atomic layer etching of silicon dioxide via surface modified with plasma for advanced silicon-based device fabrication
Author/Editor
OSONIO, Airah Peraro
Author Heading
OSONIO, Airah Peraro
Publication Date
2024-02-29
Publication Date (W3CDTF)
2024-02-29
Alternative Title
先進シリコン半導体デバイス製造に向けたプラズマによる表面変性処理によるシリコン酸化膜の原子層エッチングに関する研究
Degree grantor/type
名古屋大学
Date Granted
2024-02-29
Date Granted (W3CDTF)
2024-02-29