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Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study

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Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study

Material type
記事
Author
Małgorzata Sowińskaほか
Publisher
American Vacuum Society
Publication date
2015-11-23
Material Format
Digital
Journal name
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34 1
Publication Page
-
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Detailed bibliographic record

Summary, etc.:

<jats:p>The process parameters' impact of the plasma-enhanced atomic layer deposition (PE-ALD) method on the oxygen to nitrogen (O/N) ratio in titaniu...

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Digital

Material Type
記事
Publication Date
2015-11-23
Publication Date (W3CDTF)
2015-11-23
Periodical title
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
No. or year of volume/issue
34 1
Volume
34
Issue
1
Publication date of volume/issue (W3CDTF)
2015-11-23
ISSN (Periodical Title)
07342101
Publication (Periodical Title)
American Vacuum Society
Target Audience
一般
Date Created (W3CDTF)
2015-11-23
Is Referenced By
LaTiO<sub>x</sub>N<sub>y</sub> Thin Film Model Systems for Photocatalytic Water Splitting: Physicochemical Evolution of the Solid–Liquid Interface and the Role of the Crystallographic Orientation
Data Provider (Database)
国立情報学研究所 : CiNii Research