Hydrogen plasma pretreatment effect on the deposition of aluminum thin films from metalorganic chemical vapor deposition using dimethylethylamine alane

• Material Type: 記事
• Title: Hydrogen plasma pretreatment effect on the deposition of aluminum thin films from metalorganic chemical vapor deposition using dimethylethylamine alane
• Author Heading: Tae Woong Jang; Hwa Sung Rhee; Byung Tae Ahn
• Publication Date: 1999-05-01
• Publication Date (W3CDTF): 1999-05-01
• Periodical title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
• No. or year of volume/issue: 17 3
• Volume: 17
• Issue: 3
• Pages: 1031-1035
• Publication date of volume/issue (W3CDTF): 1999-05-01
• ISSN (Periodical Title): 07342101
• Publication (Periodical Title): American Vacuum Society
• Subject Heading: Surfaces, Coatings and Films; Surfaces and Interfaces; Condensed Matter Physics
• Target Audience: 一般
• DOI: 10.1116/1.581678
• Date Created (W3CDTF): 2002-07-27
• Related Material (URI): https://pubs.aip.org/avs/jva/article-pdf/17/3/1031/8186394/1031_1_online.pdf
• Is Referenced By: Effect of the H₂ plasma treatment of a seed layer on the synthesis of ZnO nanorods using a microwave hydrothermal method; https://cir.nii.ac.jp/crid/1360284924865799936; Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN.; https://cir.nii.ac.jp/crid/1390001206253719552
• Data Provider (Database): 国立情報学研究所 : CiNii Research; https://cir.nii.ac.jp/
• Original Data Provider (Database): Crossref; https://www.crossref.org

• Summary, etc.: <jats:p>To study the effect of pretreatment of substrates on the deposition behavior of Al thin films, the surfaces of TiN and SiO2 substrates were ex...