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化学溶液法による(Bi,Nd)<sub>4</sub>Ti<sub>3</sub>O<sub>12</sub>薄膜作製に及ぼすエキシマUV照射効果

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化学溶液法による(Bi,Nd)<sub>4</sub>Ti<sub>3</sub>O<sub>12</sub>薄膜作製に及ぼすエキシマUV照射効果

Material type
記事
Author
林 卓ほか
Publisher
The Ceramic Society of Japan
Publication date
2004
Material Format
Digital
Journal name
日本セラミックス協会 年会・秋季シンポジウム 講演予稿集 2004S 0
Publication Page
p.27-27
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Detailed bibliographic record

Summary, etc.:

強誘電体不揮発性メモリに応用が期待される(Bi,Nd)<sub>4</sub>Ti<sub>3</sub>O<sub>12</sub>(BNT)薄膜の研究が盛んに行われている。本研究では、BNT薄膜を化学溶液法によりPt/TiO<i><sub>x</sub></i>/SiO<sub>2</sub>/...

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Digital

Material Type
記事
Publication Date
2004
Publication Date (W3CDTF)
2004
Periodical title
日本セラミックス協会 年会・秋季シンポジウム 講演予稿集
No. or year of volume/issue
2004S 0
Volume
2004S
Issue
0
Pages
27-27