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High-Resolution Proximity Exposure through a Phase Shifter Mask

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High-Resolution Proximity Exposure through a Phase Shifter Mask

Material type
記事
Author
Nonogaki Saburoほか
Publisher
社団法人応用物理学会
Publication date
1993
Material Format
Paper
Journal name
Japanese Journal of Applied Physics 32 10
Publication Page
p.4845-4849
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Detailed bibliographic record

Summary, etc.：

A simple method to fabricate fine lines of photoresist has been developed. The method utilizes a mask containing an equal-width line-and-space pattern...

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Paper

Material Type
記事
Title
High-Resolution Proximity Exposure through a Phase Shifter Mask
Author Heading
Nonogaki Saburo
Imai Akira
Publication Date
1993
Publication Date (W3CDTF)
1993
Periodical title
Japanese Journal of Applied Physics
No. or year of volume/issue
32 10
Volume
32
Issue
10
Pages
4845-4849