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Voltage uniformity study in large-area reactors for RF plasma deposition LRP-554/96 DE97 718834

Voltage uniformity study in large-area reactors for RF plasma deposition LRP-554/96 DE97 718834
PaperMicroform規格・テクニカルリポート類
Sansonnens, L, Pletzer, A, Magni, D, Howling, A. A, Hollenstein, C1996<LS-DE97/718834>
National Diet LibraryOther Libraries in Japan

Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: the telegraph effect (LRP ; LRP/801/05)

Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: the telegraph effect (LRP ; LRP/801/05)
Paper図書
Howling, A.A./\derendinger, L.2005.
Other Libraries in Japan
  • Author HeadingHowling, A.A. \derendinger, L.

NON-UNIFORM RF PLASMA POTENTIAL DUE TO EDGE ASYMMETRY IN LARGE-AREA RF REACTORS (LRP ; LRP-788/04)

NON-UNIFORM RF PLASMA POTENTIAL DUE TO EDGE ASYMMETRY IN LARGE-AREA RF REACTORS (LRP ; LRP-788/04)
Paper図書
HOWLING, A.A./SANSONNENS, L.2004.
Other Libraries in Japan
  • Author HeadingHOWLING, A.A. SANSONNENS, L.

POWER LAWS FOR THE SPATIAL DEPENDENCE OF ELECTRICAL PARAMETERS IN THE HIGH VOLTAGE, CAPACITIVE RF SHEATH (LRP ; LRP-659/00)

POWER LAWS FOR THE SPATIAL DEPENDENCE OF ELECTRICAL PARAMETERS IN THE HIGH VOLTAGE, CAPACITIVE RF SHEATH (LRP ; LRP-659/00)
Paper図書
MUELLER, H./HOWLING, A.A.2000.
Other Libraries in Japan
  • Author HeadingMUELLER, H. HOWLING, A.A.

CHARGE SCREENING IN THE HIGH VOLTAGE, CAPACITIVE RF SHEATH (LRP ; LRP-662/00)

CHARGE SCREENING IN THE HIGH VOLTAGE, CAPACITIVE RF SHEATH (LRP ; LRP-662/00)
Paper図書
MUELLER, H./HOWLING, A.A.2000.
Other Libraries in Japan
  • Author HeadingMUELLER, H. HOWLING, A.A.

GAS FLOW UNIFORMITY STUDY IN LARGE-AREA SHOWERHEAD REACTORS FOR RF PLASMA DEPOSITION (LRP ; LRP-642/99)

GAS FLOW UNIFORMITY STUDY IN LARGE-AREA SHOWERHEAD REACTORS FOR RF PLASMA DEPOSITION (LRP ; LRP-642/99)
Paper図書
SANSONNENS, L./HOWLING, A.A.1999.
Other Libraries in Japan
  • Author HeadingSANSONNENS, L. HOWLING, A.A.

CHARACTERIZING HYDROGENATED MICROCRYSTALLINE SILICON FILMS BY SPECTROSCOPIC ELLIPSOMETRY (LRP ; LRP-596/98)

CHARACTERIZING HYDROGENATED MICROCRYSTALLINE SILICON FILMS BY SPECTROSCOPIC ELLIPSOMETRY (LRP ; LRP-596/98)
Paper図書
NOSENKO, V./HOWLING, A.A.1998.
Other Libraries in Japan
  • Author HeadingNOSENKO, V. HOWLING, A.A.

SILICON OXIDE PARTICLE FORMATION IN RF PLASMAS INVESTIGATED BY INFRARED ABSORPTION SPECTROSCOPY AND MASS SPECTROMETRY (LRP ; LRP-578/97)

SILICON OXIDE PARTICLE FORMATION IN RF PLASMAS INVESTIGATED BY INFRARED ABSORPTION SPECTROSCOPY AND MASS SPECTROMETRY (LRP ; LRP-578/97)
Paper図書
HOLLENSTEIN, CH./HOWLING, A.A.1997.
Other Libraries in Japan
  • Author HeadingHOLLENSTEIN, CH. HOWLING, A.A.

FROM MOLECULES TO PARTICLES IN SILANE PLASMAS. (LRP ; LRP-520/95)

FROM MOLECULES TO PARTICLES IN SILANE PLASMAS. (LRP ; LRP-520/95)
Paper図書
HOWLING, A.A.(et al.)1995.
Other Libraries in Japan
  • Author HeadingHOWLING, A.A.

NEGATIVE HYDROGENATED SILICON ION CLUSTERS AS PARTICLE PRECURSORS IN RF SILANE PLASMA DEPOSITION EXPERIMENTS. (LRP ; LRP-472/93)

NEGATIVE HYDROGENATED SILICON ION CLUSTERS AS PARTICLE PRECURSORS IN RF SILANE PLASMA DEPOSITION EXPERIMENTS. (LRP ; LRP-472/93)
Paper図書
HOWLING, A.A.(et al.)1993.
Other Libraries in Japan
  • Author HeadingHOWLING, A.A.

TIME-RESOLVED MEASUREMENTS OF HIGHLY-POLYMERISED NEGATIVE IONS IN RF SILANE PLASMA DEPOSITION EXPERIMENTS. (LRP ; LRP-479/93)

TIME-RESOLVED MEASUREMENTS OF HIGHLY-POLYMERISED NEGATIVE IONS IN RF SILANE PLASMA DEPOSITION EXPERIMENTS. (LRP ; LRP-479/93)
Paper図書
HOWLING, A.A.(et al.)1993.
Other Libraries in Japan
  • Author HeadingHOWLING, A.A.

NEGATIVE ION MASS SPECTRA AND PARTICULATE FORMATION IN RF SILANE PLASMA DEPOSITION EXPERIMENTS. (LRP ; LRP-461/92)

NEGATIVE ION MASS SPECTRA AND PARTICULATE FORMATION IN RF SILANE PLASMA DEPOSITION EXPERIMENTS. (LRP ; LRP-461/92)
Paper図書
HOWLING, A.A.(et al.)1992.
Other Libraries in Japan
  • Author HeadingHOWLING, A.A.

FREQUENCY EFFECTS IN SILANE PLASMAS FOR PECVD. (LRP ; LRP-435/91)

FREQUENCY EFFECTS IN SILANE PLASMAS FOR PECVD. (LRP ; LRP-435/91)
Paper図書
HOWLING, A.A.(et al.)1991.
Other Libraries in Japan
  • Author HeadingHOWLING, A.A.

DIRECT VISUAL OBSERVATION OF POWDER DYNAMICS IN RF PLASMA-ASSISTED DEPOSITION. (LRP ; LRP-427/91)

DIRECT VISUAL OBSERVATION OF POWDER DYNAMICS IN RF PLASMA-ASSISTED DEPOSITION. (LRP ; LRP-427/91)
Paper図書
HOWLING, A.A.(et al.)1991.
Other Libraries in Japan
  • Author HeadingHOWLING, A.A.

FREQUENCY EFFECTS IN SILANE PLASMAS FOR RECVD (LRP ; LRP-435/91)

FREQUENCY EFFECTS IN SILANE PLASMAS FOR RECVD (LRP ; LRP-435/91)
Paper図書
HOWLING, A.A./DORIER, J.-L.1991.
Other Libraries in Japan
  • Author HeadingHOWLING, A.A. DORIER, J.-L.

PAPERS CONTRIBUTED TO THE 16TH EUROPEAN CONFERENCE ON CONTROLLED FUSION AND PLASMA HEATING (LRP ; LRP-372/89)

PAPERS CONTRIBUTED TO THE 16TH EUROPEAN CONFERENCE ON CONTROLLED FUSION AND PLASMA HEATING (LRP ; LRP-372/89)
Paper図書
DUDOK DE WIT, T./HOWLING, A.A.1989.
Other Libraries in Japan
  • Author HeadingDUDOK DE WIT, T. HOWLING, A.A.

CENTRAL MASS AND CURRENT DENSITY MEASUREMENTS IN TOKAMAKS USING THE DISCRETE ALFVEN WAVE SPECTRUM (LRP ; LRP-294/86)

CENTRAL MASS AND CURRENT DENSITY MEASUREMENTS IN TOKAMAKS USING THE DISCRETE ALFVEN WAVE SPECTRUM (LRP ; LRP-294/86)
Paper図書
COLLINS, G.A./HOWLING, A.A.1986.
Other Libraries in Japan
  • Author HeadingCOLLINS, G.A. HOWLING, A.A.

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