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A study of defect generation phenomena in single crystalline silicon substrate during plasma processing and the characterization techniques

A study of defect generation phenomena in single crystalline silicon substrate during plasma processing and the characterization techniques
デジタル博士論文障害者向け資料あり
Nakakubo, Yoshinori2015-05-25
インターネットで読める国立国会図書館全国の図書館
  • 件名plasma silicon damage defect spectroscopic ellipsometry photoreflectance spectroscopy...

A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement

A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement
デジタル博士論文障害者向け資料あり
Matsuda, Asahiko2013-05-23
インターネットで読める国立国会図書館全国の図書館
  • 件名...ilicon devices Spectroscopic ellipsometry Photoreflectance spectroscopy

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