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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment

Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment
Paper図書
editors, M. C. Öztürk ... [et al.] ; sponsoring divisions, Electronics and Photonics, Dielectric Science & Technology, High Temperature MaterialsElectrochemical Societyc2007
Other Libraries in Japan
  • Author HeadingÖztürk, M. C. Electrochemical Society. Mee...

Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment

Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment
Paper図書
editors, P.J. Timans ... [et al.] ; sponsoring divisions, Electronics and Photonics, Dielectric Science & Technology, High Temperature MaterialsElectrochemical Societyc2008
Other Libraries in Japan
  • Author Heading...H. Kwong, D.-L Öztürk, M. C Roozeboom, F. Electrochemical...

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