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High temperature materials synthesis without heat: Oxide layer growth on electronic materials using high-kinetic-energy atomic oxygen LA-UR-96-791 DE96 008326

High temperature materials synthesis without heat: Oxide layer growth on electronic materials using high-kinetic-energy atomic oxygen LA-UR-96-791 DE96 008326
PaperMicroform規格・テクニカルリポート類
Hoffbauer, M. A, Cross, J. B, Archuleta, F. A1996<LS-DE96/008326>
National Diet LibraryOther Libraries in Japan

HIGH INTENSITY 5 EV CW LASER SUBSTAINED O-ATOM EXPOSURE FACILITY FOR MATERIAL DEGRADATION STUDIES (CONF ; CONF-861182-1)

HIGH INTENSITY 5 EV CW LASER SUBSTAINED O-ATOM EXPOSURE FACILITY FOR MATERIAL DEGRADATION STUDIES (CONF ; CONF-861182-1)
Paper図書
1986.
Other Libraries in Japan
  • Author HeadingCross, J B Spangler, L H Hoffbauer, M A Archuleta, F A

CO/SUB 2/ LASER SUSTAINED CW DISCHARGE ATOMIC BEAM SOURCE (CONF ; CONF-860636-3)

CO/SUB 2/ LASER SUSTAINED CW DISCHARGE ATOMIC BEAM SOURCE (CONF ; CONF-860636-3)
Paper図書
1986.
Other Libraries in Japan
  • Author HeadingCross, J B Cremers, D A Spangler, L H Hoffbauer, M A Archuleta, F A

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