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制限反応スパッタ製膜法による高誘電率YSZ絶縁膜の研究
制限反応スパッタ製膜法による高誘電率YSZ絶縁膜の研究
Digital
文書・図像類
佐々木, 公洋, Sasaki, Kimihiro
金沢大学理工研究域電子情報通信学系
2003-06
平成14(2002)年度 科学研究費補助金 基盤研究(C) 研究成果報告書 = 2002 Fiscal Year Final Research Report
2001-2002
p.4p.-
Other Libraries in Japan
Subject Heading
スパッタリング 薄膜 メタリックモード
High-K材料
制限反応 ZrO_2 MOSFET Sputtering ...
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