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A Study on Plasma Process-Induced Defect Creation in Si-Based Devices

A Study on Plasma Process-Induced Defect Creation in Si-Based Devices
Digital博士論文障害者向け資料あり
Sato, Yoshihiro2023-03-23
Available onlineNational Diet LibraryOther Libraries in Japan
  • Subject HeadingPlasma-induced damage Plasma etching Defect Leakage current P–n junction Silicon devices

A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement

A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement
Digital博士論文障害者向け資料あり
Matsuda, Asahiko2013-05-23
Available onlineNational Diet LibraryOther Libraries in Japan
  • Subject Heading...induced damage Silicon devices Spectroscopic ellipsometry Ph...

プラズマプロセス中のイオン照射により誘起される絶縁体および半導体材料の物性変化に関する研究

プラズマプロセス中のイオン照射により誘起される絶縁体および半導体材料の物性変化に関する研究
Digital博士論文
濱野, 誉Kyoto University2023-03-23
Available onlineOther Libraries in Japan
  • Subject HeadingPlasma processing Ion irradiation Boron nitride Electrical analyses Silicon devices Defect

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