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A study of defect generation phenomena in single crystalline silicon substrate during plasma processing and the characterization techniques

A study of defect generation phenomena in single crystalline silicon substrate during plasma processing and the characterization techniques
Digital博士論文障害者向け資料あり
Nakakubo, Yoshinori2015-05-25
Available onlineNational Diet LibraryOther Libraries in Japan
  • Subject Heading...c ellipsometry photoreflectance spectroscopy capacitance-voltage measureme...

A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement

A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement
Digital博士論文障害者向け資料あり
Matsuda, Asahiko2013-05-23
Available onlineNational Diet LibraryOther Libraries in Japan
  • Subject Heading...c ellipsometry Photoreflectance spectroscopy

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