Journal of photopolymer science and technology

• 資料種別: 雑誌
• ISSN: 0914-9244
• ISSN-L: 0914-9244
• タイトル: Journal of photopolymer science and technology
• 巻次・部編番号: 21(4)-21(6):2008(P.465-812)
• 著者標目: フォトポリマー学会 フォトポリマー ガッカイ ( 001142273 )典拠; Conference of Photopolymer Science and Technology ( 01236612 )典拠; フォトポリマー懇話会 フォトポリマー コンワカイ ( 00283295 )典拠
• 出版事項: Chiba : The Society of Photopolymer Science and Technology
• 出版年月日等: 2008
• 出版年（W3CDTF）: 2008
• 出版表示等に関する注記: Place of publication varies; Publisher: Technical Association of Photopolymers, Japan (v. 6, no. 1-v. 23, no. 6); The Conference of Photopolymer Science and Technology (v. 24, no. 1-v. 25, no. 6)
• 刊行巻次・年月次: v. 6, no. 1 (1993)-
• 大きさ: 29cm
• 出版地（国名コード）: JP
• 本文の言語コード: eng
• NDLC: ZP48
• 一般注記: Description based on the latest issue; Frequency varies
• 所蔵機関: 国立国会図書館
• 請求記号: Z53-W515
• 関連情報: 区分換; https://ndlsearch.ndl.go.jp/books/R100000002-I000000065969
• 連携機関・データベース: 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• 書誌ID（NDLBibID）: 000000156586; http://id.ndl.go.jp/bib/000000156586
• 全国書誌番号: 10050993
• 目録規則: 国立国会図書館逐次刊行物目録規則
• 整理区分コード: 132

目次

Degradation of hydrocarbon fluids in the immersion lithography at 193 nm

An update on the progress in high-n immersion lithography

The use of nanocomposite materials for high refractive index immersion lithography

High refractive index fluid evaluations at 193 nm: fluid lifetime and fluid/resist interaction studies

New polymer design by DLS analysis of development defect detection

A research on polymerization of o-, m-, and p-vinylphenol

Study of PAG material design for ArF immersion photoresist

Photoinduced long-range charge transfer in polyelectrolyte multilayers

A change in mechanical and electrical properties of Sn-doped indium oxide layer on plastic substrate by the post-annealing

Dependence of the deposition rate on probe-substrate separation in nonadiabatic near-field optical CVD

PAG study of PAG bonded resist for EUV and EB lithography

EUV resist outgassing: quantification and release mechanisms

Development of new advanced resist materials for microlithography

Design and synthesis of photoacid generating systems

Sensitization reaction of oxime type photoacid generator