Silicon nitride and silicon dioxide thin insulating films 7 : proceedings of the international symposium. : 203rd meeting of The Electrochemical Society : Apr 2003, Paris, France.

• 資料種別: 図書
• ISBN: 1566773474
• タイトル: Silicon nitride and silicon dioxide thin insulating films 7 : proceedings of the international symposium. : 203rd meeting of The Electrochemical Society : Apr 2003, Paris, France.
• シリーズタイトル: PV ; 2003-02
• タイトル標目: Proceedings (Electrochemical Society) ; v. 2003-02.
• 著者標目: Sah, R. E. (Ram Ekwal); Electrochemical Society. Meeting (203rd : 2003 : Paris, France); Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (7th : 2003 : Paris, France)
• 出版事項: Pennington : Electrochemical Society
• 出版年月日等: c2003.
• 出版年（W3CDTF）: 2003
• 数量: xii, 636 p. : ill. ; 24 cm.
• 出版地（国名コード）: US
• 本文の言語コード: eng
• 件名標目: Thin film devices -- Congresses.; Silicon nitride -- Congresses.; Silica -- Congresses.; Electric insulators and insulation -- Thin films -- Congresses.
• LCC: TK7872.T55
• DDC: 621.3815/2
• NDLC: M17
• 一般注記: Selected papers.; "The Proceedings Volume is published before the conference. It includes 34 of the 41 papers to be presented." -- preface.
• 書誌注記: Includes bibliographical references and indexes.
• 所蔵機関: 国立国会図書館
• 請求記号: M17-03-5342
• 連携機関・データベース: 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• 書誌ID（NDLBibID）: 000004176819; http://id.ndl.go.jp/bib/000004176819
• LC control number: 2003100710; https://lccn.loc.gov/2003100710
• RLIN番号: CSUGA5477453-B
• 整理区分コード: 215