Stay on the cutting edge with UV&EB curing technology : technical conference proceedings : RadTech UV&EB 2008 : technology expo & conference : May 4-7, 2008 McCormick Place, Chicago, IL, USA. : e/5: UV & EB technology expo & conference 2008 : May 2008, Cicago, IL.

• 資料種別: 図書
• タイトル: Stay on the cutting edge with UV&EB curing technology : technical conference proceedings : RadTech UV&EB 2008 : technology expo & conference : May 4-7, 2008 McCormick Place, Chicago, IL, USA. : e/5: UV & EB technology expo & conference 2008 : May 2008, Cicago, IL.
• 著者標目: RadTech 2008 (2008 : Chicago, Ill.)
• 出版事項: [Bethesda] : RadTech
• 出版年月日等: [c2008]
• 出版年（W3CDTF）: 2008
• 数量: 1098 p. : ill. ; 28 cm.
• 並列タイトル等: Stay on the cutting edge with UV&EB curing technology : technical conference proceedings : RadTech UV&EB 2008 : technology expo and conference : May 4-7, 2008 McCormick Place, Chicago, IL, USA; RadTech UV&EB 2008 technical conference
• 出版地（国名コード）: US
• 本文の言語コード: eng
• 件名標目: Curing -- Congresses.; Radiation -- Industrial applications -- Congresses.; Ultraviolet radiation -- Industrial applications -- Congresses.; Radiation curing -- Congresses.; Electron beam curing -- Congresses.
• LCC: TP156.C8 R131 2008
• NDLC: M17
• 一般注記: Papers and an abstract.; Cover title.; Described as " (...) May 5-8, 2008, Chicago, IL" -- p. 513.
• 書誌注記: Includes bibliographical references.
• 所蔵機関: 国立国会図書館
• 請求記号: M17-09-211
• 連携機関・データベース: 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• 書誌ID（NDLBibID）: 000009816707; http://id.ndl.go.jp/bib/000009816707
• OCLC番号: 299027168; https://www.worldcat.org/oclc/299027168
• 整理区分コード: 215