Thin films v. 25

• 資料種別: 図書
• ISBN: 0125330251
• タイトル: Thin films
• 巻次・部編番号: v. 25
• 出版事項: Academic Press
• 大きさ: 24 cm
• 並列タイトル等: Thin films : advances in research and development
• 出版地（国名コード）: us
• 本文の言語コード: en
• 対象利用者: 一般
• 一般注記: Serial editors: inorganic thin films, Stephen M. Rossnagel ; organic thin films, Abraham Ulman; Continued from: Physics of thin films : advances in research and development. vols. 1(1963)-19(1994). <BA04340456>; Continued by: Thin films and nanostructures. v.30- <BA54794568>; v. 25. Author and subject cummulative index, including table of contents, vols. 1-24; "Thin films : advances in research and development" -- v. 23
• 関連情報: Homojunction and quantum-well infrared detectors; https://cir.nii.ac.jp/crid/1130000794239635712; PVD for microelectronics : sputter deposition applied to semiconductor manufacturing; https://cir.nii.ac.jp/crid/1130000795220249216; Heterojunctions for high-speed and infrared applications; https://cir.nii.ac.jp/crid/1130000796686281600; Organic thin films and surfaces : directions for the nineties; https://cir.nii.ac.jp/crid/1130000797752145536; Frontiers of thin film technology; https://cir.nii.ac.jp/crid/1130282268747506560; Non-crystalline films for device structures; https://cir.nii.ac.jp/crid/1130282269486847104; Modeling of film deposition for microelectronic applications; https://cir.nii.ac.jp/crid/1130282270273368704; Ionized physical vapor deposition; https://cir.nii.ac.jp/crid/1130282271375913344; Self-assembled monolayers of thiols; https://cir.nii.ac.jp/crid/1130282273338710272
• 関連情報（URI）: https://ci.nii.ac.jp/ncid/BA25443322#entity
• 連携機関・データベース: 国立情報学研究所 : CiNii Research
• 提供元機関・データベース: CiNii Books; https://ci.nii.ac.jp/books
• NACSIS書誌ID（NCID）: https://ci.nii.ac.jp/ncid/BA25443322 : BA25443322