Proceedings of the third Symposium on Plasma Processing

• 資料種別: 図書
• タイトル: Proceedings of the third Symposium on Plasma Processing
• 著者・編者: edited by: J. Dieleman, R.G. Frieser, G. S. Mathad
• 著者標目: Symposium on Plasma Processing; https://ci.nii.ac.jp/author/DA03267153; Dieleman, J.; https://ci.nii.ac.jp/author/DA09030678; Frieser, R. G.; Mathad, G. S.; https://ci.nii.ac.jp/author/DA03249537; Electrochemical Society. Dielectrics and Insulation Division; https://ci.nii.ac.jp/author/DA03570741; Electrochemical Society. Electronics Division; https://ci.nii.ac.jp/author/DA0357072X
• 出版事項: Electrochemical Society
• 出版年月日等: c1982
• 出版年（W3CDTF）: 1982
• 大きさ: 23 cm
• 並列タイトル等: Plasma processing
• 出版地（国名コード）: us
• 本文の言語コード: en
• 件名標目: Integrated circuits -- Large scale integration -- Congresses
• 対象利用者: 一般
• 一般注記: Includes bibliographical references and index; "... held during the Autumn meeting of the Electrochemical Society, October 11-16, 1981 in Denver, Colo." -- on pref; Sponsored by: the Dielectrics & Insulation Division and the Electronics Division
• 関連情報: Proceedings; https://cir.nii.ac.jp/crid/1130282269273401728
• 関連情報（URI）: https://ci.nii.ac.jp/ncid/BA84886020#entity; https://lccn.loc.gov/82082859
• 掲載誌: Proceedings; https://cir.nii.ac.jp/crid/1130282269273401728
• 連携機関・データベース: 国立情報学研究所 : CiNii Research
• 提供元機関・データベース: CiNii Books; https://ci.nii.ac.jp/books
• NACSIS書誌ID（NCID）: https://ci.nii.ac.jp/ncid/BA84886020 : BA84886020
• LC control number: 82082859; https://lccn.loc.gov/82082859