Thin film materials, processes, and reliability : proceedings of the international symposium

• 資料種別: 図書
• ISBN: 1566773571
• タイトル: Thin film materials, processes, and reliability : proceedings of the international symposium
• 著者・編者: editor, G.S. Mathad ; assistant editors, M. Engelhardt ...[et al.]
• 著者標目: Mathad, G. S.; https://ci.nii.ac.jp/author/DA03249537; Engelhardt, M. (Michael); Electrochemical Society. Dielectric Science and Technology Division; https://ci.nii.ac.jp/author/DA06421624; Electrochemical Society. Electronics Division; https://ci.nii.ac.jp/author/DA0357072X; Electrochemical Society. Electrodeposition Division; https://ci.nii.ac.jp/author/DA06133470; Electrochemical Society. Meeting; https://ci.nii.ac.jp/author/DA03398898; International Society of Electrochemistry. Meeting; https://ci.nii.ac.jp/author/DA12237583
• 出版事項: Electrochemical Society
• 出版年月日等: c2001
• 出版年（W3CDTF）: 2001
• 大きさ: 24 cm
• 出版地（国名コード）: us
• 本文の言語コード: en
• 件名標目: Thin film devices -- Design and construction -- Congresses; Thin films -- Congresses; Plasma etching -- Congresses
• LCC: TK7872.T55
• 対象利用者: 一般
• 一般注記: "These symposia, jointly sponsored by Dielectric Science & Technology, Electronics, and Electrodeposition dicisions, were held as part of the 2001 Joint International Meeting -the 200th Meeting of The Electrochemical Society, Inc. and the 52nd Annual Meeting of the International Society of Electrochemistry, in San Francisco, CA, September 2-7, 2001" --on pref; Includes bibliographical references and indexes
• 関連情報: Proceedings; https://cir.nii.ac.jp/crid/1130282269273401728
• 関連情報（URI）: https://ci.nii.ac.jp/ncid/BA59009269#entity; https://lccn.loc.gov/2001097818
• 掲載誌: Proceedings; https://cir.nii.ac.jp/crid/1130282269273401728
• 連携機関・データベース: 国立情報学研究所 : CiNii Research
• 提供元機関・データベース: CiNii Books; https://ci.nii.ac.jp/books
• NACSIS書誌ID（NCID）: https://ci.nii.ac.jp/ncid/BA59009269 : BA59009269
• LC control number: 2001097818; https://lccn.loc.gov/2001097818