軟X線源を用いた半導体薄膜の低温結晶化技術の開発 (シリコン材料・デバイス)

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軟X線源を用いた半導体薄膜の低温結晶化技術の開発

(シリコン材料・デバイス)

Call No. (NDL)
Z16-940
Bibliographic ID of National Diet Library
023371037
Material type
記事
Author
部家 彰ほか
Publisher
東京 : 電子情報通信学会
Publication date
2011-12-16
Material Format
Paper
Journal name
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 111(357):2011.12.16
Publication Page
p.71-76
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Paper

Material Type
記事
Author/Editor
部家 彰
野々村 勇希
木野 翔太 他
Alternative Title
Development of Low-Temperature Crystallization Method of Thin Film Semiconductor Using Soft X-ray Source
Periodical title
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue
111(357):2011.12.16
Volume
111
Issue
357