Volume number69巻2号 2012年
ノボラック系ポジ型レ...

ノボラック系ポジ型レジストにおけるプリベーク温度が現像特性に及ぼす影響

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ノボラック系ポジ型レジストにおけるプリベーク温度が現像特性に及ぼす影響

Call No. (NDL)
Z17-92
Bibliographic ID of National Diet Library
023542127
Material type
記事
Author
石黒 啓太ほか
Publisher
東京 : 高分子学会
Publication date
2012
Material Format
Paper
Journal name
高分子論文集 = Japanese journal of polymer science and technology 69(2):2012
Publication Page
p.77-83
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Paper

Material Type
記事
Author/Editor
石黒 啓太
河野 昭彦
関口 淳 他
Alternative Title
Prebake Temperature Dependence of Development Characteristics in the Positive-Tone Novolak Resist
Periodical title
高分子論文集 = Japanese journal of polymer science and technology
No. or year of volume/issue
69(2):2012
Volume
69
Issue
2
Pages
77-83