High-Rate Reactive Deposition of SiO₂ Films Using a New DC Rotary Sputtering Cathode
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- Material Type
- 記事
- Author/Editor
- Hiroyasu KOJIMANagahiro SAITOOsamu TAKAI
- Author Heading
- Periodical title
- 表面技術 = Journal of the Surface Finishing Society of Japan
- No. or year of volume/issue
- 63(3):2012.3
- Volume
- 63
- Issue
- 3
- Pages
- 179-183
- Publication date of volume/issue (W3CDTF)
- 2012-03