極端紫外光を用いた6...

極端紫外光を用いた6インチマスクの位相欠陥検査 (実用化に向かう極端紫外リソグラフィー)

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極端紫外光を用いた6インチマスクの位相欠陥検査

(実用化に向かう極端紫外リソグラフィー)

Call No. (NDL)
Z15-269
Bibliographic ID of National Diet Library
023593824
Material type
記事
Author
寺澤 恒男ほか
Publisher
東京 : 日本光学会
Publication date
2012-03
Material Format
Paper
Journal name
光学 = Japanese journal of optics : publication of the Optical Society of Japan 41(3):2012.3
Publication Page
p.138-143
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Paper

Material Type
記事
Author/Editor
寺澤 恒男
山根 武
Alternative Title
At Wavelength Inspection of 6-inch Extreme Ultraviolet Lithography Mask Blank
Periodical title
光学 = Japanese journal of optics : publication of the Optical Society of Japan
No. or year of volume/issue
41(3):2012.3
Volume
41
Issue
3