極端紫外光リソグラフ...

極端紫外光リソグラフィー用レジスト開発 : レジスト内での像形成という視点から (実用化に向かう極端紫外リソグラフィー)

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極端紫外光リソグラフィー用レジスト開発 : レジスト内での像形成という視点から

(実用化に向かう極端紫外リソグラフィー)

Call No. (NDL)
Z15-269
Bibliographic ID of National Diet Library
023593835
Material type
記事
Author
古澤 孝弘
Publisher
東京 : 日本光学会
Publication date
2012-03
Material Format
Paper
Journal name
光学 = Japanese journal of optics : publication of the Optical Society of Japan 41(3):2012.3
Publication Page
p.144-148
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Paper

Material Type
記事
Author/Editor
古澤 孝弘
Author Heading
Alternative Title
Development of Extreme Ultraviolet Resists : From the Viewpoint of Image Formation in Resist Materials
Periodical title
光学 = Japanese journal of optics : publication of the Optical Society of Japan
No. or year of volume/issue
41(3):2012.3
Volume
41
Issue
3