SiGeミキシング誘...

SiGeミキシング誘起溶融成長によるGOI(Ge on Insulator)の形成 : 人工単結晶への道 (ナノテクノロジー新時代における独創的モノ作りと協調的進化)

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SiGeミキシング誘起溶融成長によるGOI(Ge on Insulator)の形成 : 人工単結晶への道(ナノテクノロジー新時代における独創的モノ作りと協調的進化)

Call No. (NDL)
Z15-243
Bibliographic ID of National Diet Library
023759978
Material type
記事
Author
宮尾 正信ほか
Publisher
東京 : 応用物理学会
Publication date
2012-05
Material Format
Paper
Journal name
応用物理 81(5):2012.5
Publication Page
p.410-414
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Paper Digital

Material Type
記事
Author/Editor
宮尾 正信
佐道 泰造
都甲 薫 他
Alternative Title
SiGe-mixing-triggered rapid-melting growth for Ge-on-insulator formation : A road to artificial crystal
Periodical title
応用物理
No. or year of volume/issue
81(5):2012.5
Volume
81
Issue
5