ミストを利用した薄膜作製技術「ミストCVD法」の開発と「a-IGZO/AlOx構造を有する酸化物TFTの大気圧形成」

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Material Type: 記事
Title: ミストを利用した薄膜作製技術「ミストCVD法」の開発と「a-IGZO/AlOx構造を有する酸化物TFTの大気圧形成」
Author/Editor: 川原村敏幸
王大鵬
古田守
Author Heading: 川原村敏幸
王大鵬
古田守
Alternative Title: Development of the Novel Thin Film Fabrication Technology using Mist, "Mist CVD" and Oxide TFT with a-IGZO/AlOx Stack Grown under Atmosphere by the Mist CVD
Periodical title: 高知工科大学紀要 = Research bulletin / 高知工科大学編
No. or year of volume/issue: 9(1):2012
Volume: 9
Issue: 1
Pages: 37-53
Publication date of volume/issue (W3CDTF): 2012
ISSN (Periodical Title): 1348-4842
ISSN-L (Periodical Title): 1348-4842
Publication (Periodical Title): 土佐山田町 (高知県) : 高知工科大学
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZM2
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z74-E121
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 023965608
http://id.ndl.go.jp/bib/023965608
Bibliographic Record Category (NDL): 632