スパッタリング法によるKNN系非鉛強誘電体薄膜の作製とその加工技術 (特集誘電体薄膜とその実用化動向)

スパッタリング法によるKNN系非鉛強誘電体薄膜の作製とその加工技術

(特集誘電体薄膜とその実用化動向)

Journal name: Ceramics Japan = セラミックス : bulletin of the Ceramic Society of Japan 47(10):2012.10

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Material Type: 記事
Title: スパッタリング法によるKNN系非鉛強誘電体薄膜の作製とその加工技術
Author/Editor: 堀切文正
柴田憲治
末永和史他
Series Title: 特集誘電体薄膜とその実用化動向
Author Heading: 堀切文正
柴田憲治
末永和史
Alternative Title: KNN Piezoelectric Film by Sputtering and The Etching Technique
Periodical title: Ceramics Japan = セラミックス : bulletin of the Ceramic Society of Japan
No. or year of volume/issue: 47(10):2012.10
Volume: 47
Issue: 10
Pages: 764-767
Publication date of volume/issue (W3CDTF): 2012-10
ISSN (Periodical Title): 0009-031X
ISSN-L (Periodical Title): 0009-031X
Publication (Periodical Title): 東京 : 日本セラミックス協会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: KNN
Lead-free
Etching
NDLC: ZP9
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z17-206
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 024018519
http://id.ndl.go.jp/bib/024018519
Bibliographic Record Category (NDL): 632