Volume number69巻11号 2012年
ノボラック系ポジ型レ...

ノボラック系ポジ型レジストにおける現像温度とレジスト特性との関係

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ノボラック系ポジ型レジストにおける現像温度とレジスト特性との関係

Call No. (NDL)
Z17-92
Bibliographic ID of National Diet Library
024107733
Material type
記事
Author
齊藤 誠二ほか
Publisher
東京 : 高分子学会
Publication date
2012
Material Format
Paper
Journal name
高分子論文集 = Japanese journal of polymer science and technology 69(11):2012
Publication Page
p.639-645
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Paper

Material Type
記事
Author/Editor
齊藤 誠二
石黒 啓太
高橋 聖司 他
Alternative Title
Relationship Between the Development Temperature and the Resist Characteristic of the Positive-Tone Novolak Resist
Periodical title
高分子論文集 = Japanese journal of polymer science and technology
No. or year of volume/issue
69(11):2012
Volume
69
Issue
11
Pages
639-645