スパッタ堆積法によるSi/Geの低温高速エピタキシャル成長と太陽電池応用 (材料開発最前線 : 新しく登場した太陽電池素材)

スパッタ堆積法によるSi/Geの低温高速エピタキシャル成長と太陽電池応用

(材料開発最前線 : 新しく登場した太陽電池素材)

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Material Type: 記事
Title: スパッタ堆積法によるSi/Geの低温高速エピタキシャル成長と太陽電池応用
Author/Editor: 葉文昌
Series Title: 材料開発最前線 : 新しく登場した太陽電池素材
Author Heading: 葉文昌
Periodical title: 未来材料 = Expected materials for the future
No. or year of volume/issue: 12(12):2012.12
Volume: 12
Issue: 12
Pages: 21-25
Publication date of volume/issue (W3CDTF): 2012-12
ISSN (Periodical Title): 1346-0986
ISSN-L (Periodical Title): 1346-0986
Publication (Periodical Title): 東京 : エヌ・ティー・エス
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZM1
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z74-C175
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 024151479
http://id.ndl.go.jp/bib/024151479
Bibliographic Record Category (NDL): 632