ランダムテレグラフノ...

ランダムテレグラフノイズ(RTN)の統計的評価手法と微細MOSFETばらつきへの影響 (シリコン材料・デバイス・IEDM特集(先端CMOSデバイス・プロセス技術))

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ランダムテレグラフノイズ(RTN)の統計的評価手法と微細MOSFETばらつきへの影響

(シリコン材料・デバイス・IEDM特集(先端CMOSデバイス・プロセス技術))

Call No. (NDL)
Z16-940
Bibliographic ID of National Diet Library
024262996
Material type
記事
Author
三木 浩史ほか
Publisher
東京 : 電子情報通信学会
Publication date
2013-01-30
Material Format
Paper
Journal name
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 112(421):2013.1.30
Publication Page
p.31-34
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Paper

Material Type
記事
Author/Editor
三木 浩史
手賀 直樹
山岡 雅直 他
Alternative Title
Statistical Analysis of Random Telegraph Noise (RTN) and its Impact on Variation in Threshold Voltage of Highly Scaled MOSFET
Periodical title
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue
112(421):2013.1.30
Volume
112
Issue
421