X線光電子分光分析によるセシウム化合物の化学シフト(特集放射能の除染にかかわる表面科学)

Journal name: 表面科学 = Journal of the Surface Science Society of Japan / 日本表面科学会編 34(3):2013.3

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Material Type: 記事
Title: X線光電子分光分析によるセシウム化合物の化学シフト
Author/Editor: 八田珠郎
根本清子
万福裕造他
Series Title: 特集放射能の除染にかかわる表面科学
Author Heading: 八田珠郎
根本清子
万福裕造
Alternative Title: Chemical Shift of Cesium Compounds by X-ray Photoelectron Spectroscopy
Periodical title: 表面科学 = Journal of the Surface Science Society of Japan / 日本表面科学会編
No. or year of volume/issue: 34(3):2013.3
Volume: 34
Issue: 3
Pages: 131-134
Publication date of volume/issue (W3CDTF): 2013-03
ISSN (Periodical Title): 0388-5321
ISSN-L (Periodical Title): 0388-5321
Publication (Periodical Title): 東京 : 日本表面科学会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: chemical shift
Cs
XPS
NDLC: ZM35
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z15-379
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 024347628
http://id.ndl.go.jp/bib/024347628
Bibliographic Record Category (NDL): 632