130 kV High-Resolution Electron Beam Lithography System for Sub-10-nm Nanofabrication (Special Issue : Microprocesses and Nanotechnology)

130 kV High-Resolution Electron Beam Lithography System for Sub-10-nm Nanofabrication

(Special Issue : Microprocesses and Nanotechnology)

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Material Type: 記事
Title: 130 kV High-Resolution Electron Beam Lithography System for Sub-10-nm Nanofabrication
Author/Editor: Teruaki Okino
Yukio Kuba
Masahiro Shibata 他
Series Title: Special Issue : Microprocesses and Nanotechnology
Author Heading: Teruaki Okino
Yukio Kuba
Masahiro Shibata
Periodical title: Japanese journal of applied physics : JJAP
No. or year of volume/issue: 52(6)(2):2013.6
Volume: 52
Issue: 6
Sequential issue number: 2
Pages: 06GB01-1-6
Publication date of volume/issue (W3CDTF): 2013-06
ISSN (Periodical Title): 0021-4922
ISSN-L (Periodical Title): 0021-4922
Publication (Periodical Title): Tokyo : The Japan Society of Applied Physics
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: ZM35
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-A375
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 024643631
http://id.ndl.go.jp/bib/024643631
Bibliographic Record Category (NDL): 632