パルス電解条件が銅め...

パルス電解条件が銅めっき皮膜の結晶配向性とエッチングレートに与える影響

Icons representing 記事

パルス電解条件が銅めっき皮膜の結晶配向性とエッチングレートに与える影響

Call No. (NDL)
Z17-291
Bibliographic ID of National Diet Library
024687238
Material type
記事
Author
久保田 賢治ほか
Publisher
東京 : 表面技術協会
Publication date
2013-06
Material Format
Paper
Journal name
表面技術 = Journal of the Surface Finishing Society of Japan 64(6):2013.6
Publication Page
p.368-370
View All

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

  • CiNii Research

    Search Service
    Digital
    You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper Digital

Material Type
記事
Author/Editor
久保田 賢治
松本 克才
吉原 佐知雄
Alternative Title
Effect of Pulse Parameters on the Crystal Orientation and Etching Rate of Copper Films
Periodical title
表面技術 = Journal of the Surface Finishing Society of Japan
No. or year of volume/issue
64(6):2013.6
Volume
64
Issue
6
Pages
368-370