コヒーレントEUV光源を用いたEUVLマスクの欠陥検出 (特集 リソグラフィとその関連技術・応用技術)
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- Material Type
- 記事
- Author/Editor
- 永田 豊原田 哲男渡邊 健夫 他
- Series Title
- Alternative Title
- Detection of Defects in EUVL Mask using Coherent EUV Source
- Periodical title
- 電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials
- No. or year of volume/issue
- 133(10):2013.10
- Volume
- 133
- Issue
- 10