Volume number133(10)2013.10
半導体プロセスへの自...

半導体プロセスへの自己組織化リソグラフィ応用 (特集 リソグラフィとその関連技術・応用技術)

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半導体プロセスへの自己組織化リソグラフィ応用(特集 リソグラフィとその関連技術・応用技術)

Call No. (NDL)
Z16-793
Bibliographic ID of National Diet Library
024946512
Material type
記事
Author
清野 由里子ほか
Publisher
東京 : 電気学会
Publication date
2013-10
Material Format
Paper
Journal name
電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials 133(10):2013.10
Publication Page
p.532-536
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Paper Digital

Material Type
記事
Author/Editor
清野 由里子
加藤 寛和
米満 広樹 他
Alternative Title
Application of Directed Self-Assembly Lithography to Semiconductor Device Manufacturing Process
Periodical title
電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials
No. or year of volume/issue
133(10):2013.10
Volume
133
Issue
10