雑誌材料
ミストCVD法による...

ミストCVD法によるAlOx薄膜作製に対するO₃支援の効果 (特集 半導体エレクトロニクス)

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ミストCVD法によるAlOx薄膜作製に対するO₃支援の効果(特集 半導体エレクトロニクス)

Call No. (NDL)
Z14-267
Bibliographic ID of National Diet Library
025017959
Material type
記事
Author
内田 貴之ほか
Publisher
京都 : 日本材料学会
Publication date
2013-11
Material Format
Paper
Journal name
材料 / 日本材料学会 [編] 62(11):2013.11
Publication Page
p.663-667
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Paper Digital

Material Type
記事
Author/Editor
内田 貴之
川原村 敏幸
古田 守 他
Alternative Title
The Effect of O₃ Support for Fabrication of AlOx Thin Film by Mist CVD Technique
Periodical title
材料 / 日本材料学会 [編]
No. or year of volume/issue
62(11):2013.11
Volume
62
Issue
11